BE793605A - Appareil et procede pour corriger un masque photographique defectueux - Google Patents

Appareil et procede pour corriger un masque photographique defectueux

Info

Publication number
BE793605A
BE793605A BE793605DA BE793605A BE 793605 A BE793605 A BE 793605A BE 793605D A BE793605D A BE 793605DA BE 793605 A BE793605 A BE 793605A
Authority
BE
Belgium
Prior art keywords
correcting
photographic mask
defective photographic
defective
mask
Prior art date
Application number
Other languages
English (en)
French (fr)
Inventor
M Tarabocchia
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE793605A publication Critical patent/BE793605A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
BE793605D 1972-01-03 Appareil et procede pour corriger un masque photographique defectueux BE793605A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21492172A 1972-01-03 1972-01-03

Publications (1)

Publication Number Publication Date
BE793605A true BE793605A (fr) 1973-05-02

Family

ID=22800919

Family Applications (1)

Application Number Title Priority Date Filing Date
BE793605D BE793605A (fr) 1972-01-03 Appareil et procede pour corriger un masque photographique defectueux

Country Status (8)

Country Link
US (1) US3748975A (en])
JP (1) JPS5220231B2 (en])
BE (1) BE793605A (en])
CA (1) CA963982A (en])
DE (1) DE2263856C3 (en])
GB (1) GB1412995A (en])
IT (1) IT974681B (en])
SE (1) SE384745B (en])

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5096184A (en]) * 1973-12-24 1975-07-31
JPS5346597B2 (en]) * 1973-12-27 1978-12-14
JPS5333396B2 (en]) * 1974-02-06 1978-09-13
JPS51948A (en) * 1974-06-21 1976-01-07 Dainippon Printing Co Ltd Hotomasukuno seizohoho
JPS5267986A (en) * 1975-12-04 1977-06-06 Fujitsu Ltd Pattern correction equipment
JPS5423473A (en) * 1977-07-25 1979-02-22 Cho Lsi Gijutsu Kenkyu Kumiai Photomask and method of inspecting mask pattern using same
JPS54123706U (en]) * 1978-02-15 1979-08-29
JPS5527686A (en) * 1978-08-21 1980-02-27 Sony Corp Projection eliminating device
US4200668A (en) * 1978-09-05 1980-04-29 Western Electric Company, Inc. Method of repairing a defective photomask
JPS56128946A (en) * 1980-03-14 1981-10-08 Fujitsu Ltd Photomask correcting method
JPS586127A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd フオトマスク欠陥修正方法とその装置
JPS5757443U (en]) * 1981-07-16 1982-04-05
JPS58173835A (ja) * 1982-04-06 1983-10-12 Fuji Xerox Co Ltd レジストパタ−ンの欠陥修正方法
US4515878A (en) * 1982-08-30 1985-05-07 International Business Machines Corporation Printed circuit board modification process
US4548883A (en) * 1983-05-31 1985-10-22 At&T Bell Laboratories Correction of lithographic masks
US4592975A (en) * 1984-06-20 1986-06-03 Gould Inc. Method for repairing a photomask by laser-induced polymer degradation
JPS61191697U (en]) * 1985-05-20 1986-11-28
EP0203215B1 (de) * 1985-05-29 1990-02-21 Ibm Deutschland Gmbh Verfahren zur Reparatur von Transmissionsmasken
US4835576A (en) * 1986-10-17 1989-05-30 Toyo Ink Mfg. Co., Ltd. Opaquing method and apparatus thereof
JPS6381596U (en]) * 1986-11-17 1988-05-28
US5443931A (en) * 1992-03-31 1995-08-22 Matsushita Electronics Corporation Photo mask and repair method of the same
JPH05281752A (ja) * 1992-03-31 1993-10-29 Seiko Instr Inc 集束イオンビームによる加工方法
US6200737B1 (en) 1995-08-24 2001-03-13 Trustees Of Tufts College Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure
US6165649A (en) * 1997-01-21 2000-12-26 International Business Machines Corporation Methods for repair of photomasks
US5981110A (en) * 1998-02-17 1999-11-09 International Business Machines Corporation Method for repairing photomasks
CA2335951C (en) 1998-06-24 2013-07-30 Mark S. Chee Decoding of array sensors with microspheres
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
US7035449B2 (en) * 2001-11-16 2006-04-25 Taiwan Semiconductor Manufacturing Co., Ltd Method for applying a defect finder mark to a backend photomask making process
US7887752B2 (en) * 2003-01-21 2011-02-15 Illumina, Inc. Chemical reaction monitor
US7005219B2 (en) * 2003-05-08 2006-02-28 Taiwan Semiconductor Manufacturing Co., Ltd. Defect repair method employing non-defective pattern overlay and photoexposure
US7097948B2 (en) * 2003-08-29 2006-08-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method for repair of photomasks
FR2863772B1 (fr) * 2003-12-16 2006-05-26 Commissariat Energie Atomique Procede de reparation d'erreurs de motifs realises dans des couches minces
TWI261726B (en) * 2004-04-09 2006-09-11 Allied Integrated Patterning C Acceptable defect positioning and manufacturing method for large-scaled photomask blanks
US7239379B2 (en) * 2004-09-13 2007-07-03 Technology Innovations, Llc Method and apparatus for determining a vertical intensity profile through a plane of focus in a confocal microscope
US7474393B2 (en) * 2004-09-13 2009-01-06 Joel C. Wojciechowski Method and apparatus for determining a vertical intensity profile along an illuminating beam
TWI461838B (zh) * 2010-04-16 2014-11-21 Cowindst Co Ltd 用於修復半色調遮罩之方法及系統
CN113671790B (zh) * 2021-08-13 2022-06-14 深圳市龙图光电有限公司 掩模版缺陷无痕去除方法、装置、设备及其存储介质

Also Published As

Publication number Publication date
GB1412995A (en) 1975-11-05
US3748975A (en) 1973-07-31
DE2263856C3 (de) 1975-05-07
DE2263856A1 (de) 1973-07-12
JPS5220231B2 (en]) 1977-06-02
IT974681B (it) 1974-07-10
DE2263856B2 (de) 1974-09-19
SE384745B (sv) 1976-05-17
JPS4879978A (en]) 1973-10-26
CA963982A (en) 1975-03-04

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